Seminars in Spine Surgery
Volume 19, Issue 3 , Pages 206-214, September 2007

Interspinous Process Distraction Devices for Spinal Stenosis

  • David H. Kim, MD

      Affiliations

    • Department of Orthopedic Surgery, New England Baptist Hospital, Tufts University School of Medicine, Boston, MA.
    • Corresponding Author InformationAddress reprint requests to David H. Kim, MD, Tufts University School of Medicine, New England Baptist Hospital, Department of Orthopedic Surgery, 125 Parker Hill Avenue, Boston, MA 02120.
  • ,
  • Paul A. Anderson, MD

      Affiliations

    • Department of Orthopedic Surgery, University of Wisconsin, Madison, WI.

Interspinous process distraction devices represent a relatively new option for minimally invasive surgical treatment of lumbar spinal stenosis. The X STOP device is the first such implant to receive FDA approval for this indication, and promising results from initial clinical studies have encouraged development of multiple alternative implant designs. These devices are designed for placement between adjacent spinous processes and function to create relative segmental flexion at the treated level, indirectly increasing the cross-sectional area of the spinal canal as well as the neuroforamina. This technology is an option for patients with neurogenic claudication aggravated by standing or walking and relieved by sitting. Short-term clinical results appear comparable to laminectomy and superior to nonoperative treatment. Long-term clinical follow-up data are not yet available.

Keywords: interspinous process spacers, lumbar spinal stenosis, minimally invasive surgery, surgical treatment, spinal implant, clinical outcomes

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PII: S1040-7383(07)00058-5

doi:10.1053/j.semss.2007.06.008

Seminars in Spine Surgery
Volume 19, Issue 3 , Pages 206-214, September 2007